CH-Clean (Contact Hole Cleaning Solution)
- Chemical formula
- HF+NH4F+Surfactant
- Molecular weight
- 20.01(HF) 37.04(NH4F)
| Appearance | Colorless liquid |
| Packing | 1,000kg 200kg 100kg 20kg 10kg (5kg×2) |
| Properties | Surface tension 45N/m Etching rate of SiO2 film 1.5 nm/min at 20℃ |
| MITI No. | 1-306(HF) 1-311(NH4F) |
| CAS No. | 12125-01-8(NH4F) 1341-49-7(NH4HF2) |